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铁道科学与工程学报

JOURNAL OF RAILWAY SCIENCE AND ENGINEERING

Vol. 12    No. 4    August 2002

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Surface diffusivity of atomic deuterium on
Ni3(Al, Ti)(110) surface with and
without boron
J.L. Wang, Y.W. Chung

Department of Materials Science and Engineering, Robert R. McCormick
School of Engineering and Applied Science, Northwestern University, 
Evanston, IL 60208, USA

Abstract:The electron-stimulated desorption was used to measure the surface diffusivity of atomic deuterium on clean and boron-modified Ni3(Al, Ti)(110) surfaces. Boron dosing was performed using a solid-state boron ion source. Earlier studies showed that boron dissociates water readily at temperatures as low as 130K and that the resulting atomic hydrogen is bound to the surface strongly. The surface diffusion coefficient of atomic D on 0.05 monolayer boron-modified surface was measured to be about 10 times smaller than that on the clean surface. This slower diffusion of atomic hydrogen may explain why boron improves the ductility of polycrystalline Ni3Al in moist environments.

 

Key words: surface diffusion; deuterium; hydrogen; Ni3Al

ISSN 1672-7029
CN 43-1423/U

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