您目前所在的位置:首页 - 期刊简介 - 详细页面

铁道科学与工程学报

JOURNAL OF RAILWAY SCIENCE AND ENGINEERING

Vol. 12    No. 4    August 2002

[PDF Download]    [Flash Online]

    

Characterization of sputter-deposited TiPdNi
thin films
TIAN Qing-chao(田青超)1, 2, WU Jian-sheng(吴建生)1

1. Key Laboratory of Ministry of Education for High Temperature Materials
and Tests, School of Materials Science and Engineering, 
Shanghai Jiaotong University, Shanghai 200030, China;
2. Testing Center, Baoshan Iron & Steel Co., Ltd, 
Shanghai 201900, China

Abstract:TiPdNi thin films were prepared by magnetron sputtering onto unheated glass and silicon substrate. Atomic force microscope, energy-dispersive X-ray microanalyzer, X-ray diffractometer, differential scanning calorimeter and optical microscope were used to characterize the films. It is found that the surface morphology of the films change during the sputtering process and a shift of about 3%Ti(mole fraction) content from the center to the edge of the substrate occurs. The freestanding asdeposited films undergo crystallization followed by three kin d s of cooling conditions. For all these heat-treated films, B2→B19→B19′ two-stage phase transformation takes place. Many Ti2Ni and Ti2Pd type of precipitates are detected in the films. The constraint films on silicon substrate are crystallized at high temperature. After crystallization, the films show a two-way shape memory effect.

 

Key words: TiPdNi;thin film;sputter deposition;martensitic transformation; shape memory effect

ISSN 1672-7029
CN 43-1423/U

主管:中华人民共和国教育部 主办:中南大学 中国铁道学会 承办:中南大学
湘ICP备09001153号 版权所有:《铁道科学与工程学报》编辑部
------------------------------------------------------------------------------------------
地 址:湖南省长沙市韶山南路22号 邮编:410075
电 话:0731-82655133,82656174   传真:0731-82655133   电子邮箱:jrse@mail.csu.edu.cn