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铁道科学与工程学报

JOURNAL OF RAILWAY SCIENCE AND ENGINEERING

Vol. 12    No. 6    December 2002

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Electrochemical Behavior of
Er(Ⅲ) InN, N-dimethylformamide
LI Gao-ren(李高仁), TONG Ye-xiang(童叶翔),
LIU Guan-kun(刘冠昆),YUAN Ding-sheng(袁定胜),
XU Chang-wei(徐常威) , WANG Yu(王 宇)

School of Chemistry and Chemical Engineering, Zhongshan University,
 Guangzhou 510275, China

Abstract:The cyclic voltammetry, current-time curve at potential step and potential-time curve of galvanostatic method were used to investigate the electrochemical behavior of Er(Ⅲ) in ErCl3-LiClO4-DMF(N, N-dimethylformamide) system on Pt and Cu electrodes. Results indicate that the electroreducation of Er(Ⅲ) to Er(0) is irreversible on Pt and Cu electrodes, the diffusion coefficient and electron transfer coefficient of Er(Ⅲ) in 0.01mol/L ErCl3-0.1mol/L LiClO4-DMF system at 303K are 1.96×10-6 cm2·s-1 and 0.081 respectively. The Er metal film was prepared by galvanostatic electrolysis on Cu electrode in ErCl3-LiClO4-DMF system at 40A·m-2(current density). The deposites composed of Er over 95%(mass fraction) were obtained.

 

Key words: Er(Ⅲ); N, N-dimethylformamide(DMF); diffusion coefficient; electron transfer coefficient; electrodeposition

ISSN 1672-7029
CN 43-1423/U

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