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铁道科学与工程学报

JOURNAL OF RAILWAY SCIENCE AND ENGINEERING

Vol. 19    Special 1    September 2009

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Sub-micron-structure machining on silicon by femtosecond laser
Hung-Yin TSAI 1, Shao-Wei LUO1, Chih-Wei WU 2, Shing-Hoa WANG 2

1. Department of Power Mechanical Engineering, National Tsing Hua University, Hsinchu, Taiwan, China;
2. Department of Mechanical and Mechatronic Engineering, National Taiwan Ocean University,
Keelung, Taiwan, China

Abstract:Sub-micron-structure machining on silicon substrate was studied by direct writing system of femtosecond laser with the central wavelength of 800 nm, pulse duration of 120 fs and repetition rate of 1 kHz. Three kinds of experiments were conducted: 1) the effect of photoresist on silicon; 2) machinability of different orientations of silicon; and 3) the size of micro-structure and the cross-section shape. Photoresist SU8 was coated onto silicon substrates in thicknesses of 100 μm. SU8 remained on the silicon substrate while the silicon under the machined SU8 was removed after laser machining. Orientations of (100), (110), and (111) silicon substrates were machined with the laser power of 60 μW and the scanning speed of 3 mm/min. Spike morphologies were observed on all three orientations of silicon substrates without obvious directional difference of these spikes on different silicon substrates. In addition, the ablation threshold energies were also similar. In the consideration of ablation energy, one numerical model of the machining parameters has been proposed to simulate the cross-section of the micro-structure. The predicted shape by simulation can fit the profile of the cross-section shape well.

 

Key words: femtosecond laser; SU8; silicon; sub-micron structure

ISSN 1672-7029
CN 43-1423/U

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